99.999% High Purity Ni Nickel Sputtering Target Plate / Ni Nickel Metal Target

• Application: Industrial
• rumus: nikel
• klasifikasi: Metal Traget
• standar mutu: kelas industri
• sertifikasi: iso
• bentuk: Rotary,Flat,Round
• Tidak. Model.: CYT-Ni
• Paket Transportasi: Wooden Box
• Spesifikasi: Customized Size
• Merek Dagang: CANYUAN
• Asal: China
• Kapasitas Produksi: 1000PCS

Deskripsi Produk

 

Nickel is a silver-white metal and is very easily oxidized in the air. After Oxidation, there will be black oxide film on the surface. So it will be always look like black colors. Nickel can be highly polished and it is hard, very malleable, magnetic and corrosion-resistant material. Nickel is often used in the manufacturing of stainless steel, alloy structural steel and other steel fields, electroplating, high-nickel-based alloys and batteries. It is widely used in various military manufacturing industries such as aircraft and radar, civil machinery manufacturing and vacuum coating industries.

Nickel targets are mainly used in the semiconductor, microelectronics and decorative coating industries and are key materials for semiconductor back electrodes. The highest purity of the nickel targets we produce can reach 99.999%, and its grain structure is ultra-fine and uniform.
We can make flat Ni targets and rotary sputtering targets.
The description composition analysis table of 4N5 high-purity Nickel target as below:
 

Targets Specification
Application	PVD sputtering materials
Material	Nickel
Purity	5N
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	8.9g/cm3
Melting Point	1455ºC
Produce method	HIP

Our Advantage

Operation Process

Packing Picture

Application:

Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al	3N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP,Smelting
Cu	4N	-	8.9	1084	400	16.5	Smelting
Ni	3N5	-	4.5	1453	90	13	Smelting
Ti	3N	-	4.5	1668	15.2	9.4	Smelting
Zr	3N	-	6.49	1852	0.227	-	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
Ag	4N	-	10.49	961.93	429	19	Smelting
C	4N	-	2.23	3850±50	151	-	HIP
TiAl	3N5	AS REQUESTED	-	-	-	-	Smelting
InSn	4N	AS REQUESTED	-	-	-	-	Casting
CrSi	4N	AS REQUESTED	-	-	-	-	Spray
CrW	4N	AS REQUESTED	16.7	3017	57	6.3	HIP
NiCr	3N	AS REQUESTED	-	-	-	-	Smelting
WC	3N	AS REQUESTED	15.77	2870	110	5.5	Sintering&Spray
NbOx	4N	AS REQUESTED	4.6	1460	5	1.5	Sintering&Spray